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ESI离子源背景离子来源

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  • 2025/6/16 5:21:27

ESI离子源背景离子来源 m/z 33 42 59 64 65 74 79 83 85 88 101 102 104/106 105 115 120 122 123 130 137 144 145/147 Ion Compound Source of Unknown (M+H)+ methanol (M+H)+ acetonitrile (M+NH4)+ acetonitrile (M+Na)+ acetonitrile (2M+H)+ methanol (M+H)+ dimethyl formamide (M+H)+ DMSO (2M+H)+ Acetonitrile (M+H)+ d6‐DMSO (M+Formic Acid+H)+ acetonitrile (M+Na)+ DMSO (M+H)+ triethylamine (TEA) (M+Cu)+ acetonitrile (2M+Na)+ acetonitrile (M+dimethyl formamide+H)+ acetonitrile (M+Na+CH3CN)+ DMSO (M+H)+tris,tris(hydroxymethyl)aminomethane (M+H)+ dimethylaminopyridine (DMAP) (M+H)+ diisopropylethyl amine (DIPEA) (M+CH3CN+NH4)+ DMSO (M+H)+ tripropylamine (TPA) (2M+Cu)+ acetonitrile 146 149 150 153 157 159 163 167 169 171 179 186 195 214 225 231 236 239/241 242 243 257 267 273 279 (3M+Na)+ acetonitrile (M+H)+ phthalic anhydride (M+H)+ phenyldiethylamine (M+H)+1,8‐diazabicycloundec‐7‐ene(DBU) (2M+H)+ DMSO (M+Na)+ sodium trifluoroacetate dimethyl phthalate dioctyl phthalate (2M+H)+ d6‐DMSO (M+Na)+ phthalic anhydride (2M+Na)+ DMSO (M+H)+ tributylamine (M+H)+ dimethyl phthalate (M+H)+n‐butyl benzenesulfonamide (plastisizer) (M+H)+ dicyclohexyl urea (DCU) (M+NH3)+n‐butyl benzenesulfonamide(plastisizer) (M+Na)+n‐butyl benzenesulfonamide(plastisizer) + triethylamine M+ tetrabutylammonium (C4H9)4N+ M+ trityl cation (3M+H)+ DMSO (M+H)+ tributylphosphate M+ monomethoxytrityl cation (MMT) M+ triphenylphosphine oxide 279 282 284 288 301 303 317 336 338 355 360 371 388 391 413 425 429 445 449 454 462 503 519 522 M+ dibutylphthalate (plasticiser) (M+H)+ oleamideslip agent inpolyethylene films (M+H)+ stearamideslip agent inpolyethylene films (M+H)+n,n‐bis(2‐hydroxyethyl)dodecanamide anti‐static agent (M+Na)+ dibutylphthalate (plasticiser) (M+Na)+ oleamideslip agent inpolyethylene films (M+K)+ dibutylphthalate (plasticiser) (M+H)+ tributyl tin formate (M+H)+ erucamideslip agent inpolyethylene films siloxane from silicacolumn (M+Na)+ erucamideslip agent in polyethylene films (M+H)+ decamethylcyclopentasiloxane decamethylcyclopentasiloxane (M+H)+ diisooctyl phthalate (plasticiser) (M+Na)+ diisooctyl phthalate (plasticiser) (M+Na)+unidentified contaminant(plasticiser) (M+K)+ diisooctyl phthalate (plasticiser)seen w/ silica capillary NanoSprayer (M+H)+ dodecamethylcyclohexasiloxane seen w/ silica capillary NanoSprayer (2M+H)+ dicyclohexyl urea (DCU) (M+Na+CH3CN)+ diisooctyl phthalate (plasticiser)also observed w/ high conc. of formic acid dodecamethylcyclohexasiloxane seen w/ silica capillary NanoSprayer (M+H)+ tetradecamethylcycloheptasiloxane seen w/ silica capillary NanoSprayer Derived from rubber tip from disposable syringe plunger 531 536 538 550 553 555 569 587 593 609 610 625 638 667 675 679 684 696 701

(M+H)+ seen w/ Nunc polypropylene tubes seen w/ silica capillary NanoSprayer (acetate)n+(Fe)n+ observed w/ high conc. of acetic acid Derived from rubber tip from disposable syringe plunger (M+Na)+ seen w/ Nunc polypropylene tubes (acetate)n+(Fe)n+ observed w/ high conc. of acetic acid (M+K)+ seen w/ Nunc polypropylene tubes (M+H)+ seen w/ Vanguard polypropylene tubes (M+H)+ hexadecamethylcyclooctasiloxane (M+Na)+ seen w/ Vanguard polypropylene tubes seen w/ silica capillary NanoSprayer (M+K)+ seen w/ Vanguard polypropylene tubes seen w/ silica capillary NanoSprayer (M+H)+ octadecamethylcyclononasiloxane seen w/ new PEEK tubing (M+H)+ from purified water and solvent filters seen w/ silica capillary NanoSprayer (M+NH4)+ from purified water and solvent filters (M+Na)+ from purified water

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ESI离子源背景离子来源 m/z 33 42 59 64 65 74 79 83 85 88 101 102 104/106 105 115 120 122 123 130 137 144 145/147 Ion Compound Source of Unknown (M+H)+ methanol (M+H)+ acetonitrile (M+NH4)+ acetonitrile (M+Na)+ acetonitrile (2M+H)+ methanol (M+H)+ dimethyl formamide (M+H)+ DMSO (2M+H)+ Acetonitrile (M+H)+ d6‐DMSO (M+Formic Acid+H)+ acetonitrile (M+Na)+ DMSO (M+H)+ triethylamine (TEA) (M+Cu)+ acetonitrile

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